Suchita Saigal, a name familiar to the Spicy IP readers, brings yet another bit of ‘spicy’ IP news tid-bit to the fore for us, that has been presented as follows:
A recent interesting entry on the PatentlyO blog deals with ranking patent law programs in the US. As is evident from the title, “Ranking of Patent Law Programs for 2011: Perhaps Six Junk-Science Ratings Are Better Than One“, the post adopts the process of aggregation to give the reader an idea of the best patent law programs. To elaborate, six set of rankings given by various sources, including the US News & World Report and IP Law Journal, are used to give any prospective applicant a holistic overview of patent law programs. More importantly, the post deals with the methodology used in each of the rankings, related shortcomings and other such issues allowing one to make an informed choice.
Given the increased focus in Intellectual property law issues in India and the increase in general academic interest in the area, we think that this rankings post is extremely relevant to Indian students interested in IP, especially because the US is the leading light in IP law developments.
If nothing else, read it for the comments, some of which are reproduced below:
“Blah, blah, blah, blah…Typical American insubstantial credentialist-driven hierarchical sort.
THIS TYPE OF THING IS THE PROBLEM.
HOW ABOUT SOME SUBSTANTIVE CRITERIA?
NO, THAT WOULD RUIN EVERYTHING!
Posted by: An Outsider’s View | Apr 15, 2010 at 08:50 AM”
Seriously!?…is there a single practicing attorney that cares about this nonsense?
Posted by: Jason | Apr 15, 2010 at 09:02 AM
And the prize goes to:
USA, USA, USA leads the World in patent-law higher educational facilities – Way to Go USA.
THIS is the real wealth of our nation!
Posted by: Just an ordinary inventor(TM) | Apr 15, 2010 at 01:00 PM
USA, USA, USA leads the USA in patent-law higher educational facilities – Way to Go USA.
Fixed that for you. It’s a list of American schools. What country did you expect would come out on top?
Posted by: IANAE | Apr 15, 2010 at 01:34 PM
